发明名称 METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND SEMICONDUCTOR MANUFACTURING SYSTEM
摘要 A single-crystal substrate is placed on a supporting table while maintaining crystalline orientation of the single-crystal substrate. The single-crystal substrate has contacting regions on a periphery of an upper surface of the single-crystal substrate. Linear contacting surfaces of contacting pins are placed in contact with the contacting regions of the single-crystal substrate placed on the supporting table. Longitudinal directions on the contacting surfaces of all the contacting pins are not parallel to intersecting lines of the upper surface of the single-crystal substrate and cleaved surfaces of the single-crystal substrate.
申请公布号 US2013323910(A1) 申请公布日期 2013.12.05
申请号 US201313761285 申请日期 2013.02.07
申请人 MAEDA KAZUHIRO;NISHIZAWA KOICHIRO;MITSUBISHI ELECTRIC CORPORATION 发明人 MAEDA KAZUHIRO;NISHIZAWA KOICHIRO
分类号 H01L21/02 主分类号 H01L21/02
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