发明名称 PHOTOSENSTIVE MATERIAL AND METHOD OF LITHOGRAPHY
摘要 Photosensitive materials and method of forming a pattern that include providing a composition of a component of a photosensitive material that is operable to float to a top region of a layer formed from the photosensitive material. In an example, a photosensitive layer includes a first component having a fluorine atom (e.g., alkyl fluoride group). After forming the photosensitive layer, the first component floats to a top surface of the photosensitive layer. Thereafter, the photosensitive layer is patterned.
申请公布号 US2013323641(A1) 申请公布日期 2013.12.05
申请号 US201213486697 申请日期 2012.06.01
申请人 CHANG CHING-YU;TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.,("TSMC") 发明人 CHANG CHING-YU
分类号 G03F7/004;H01L21/02 主分类号 G03F7/004
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