发明名称 DOUBLE ANODIZING PROCESSES
摘要 Methods and structures for forming anodization layers that protect and cosmetically enhance metal surfaces are described. In some embodiments, methods involve forming an anodization layer on an underlying metal that permits an underlying metal surface to be viewable. In some embodiments, methods involve forming a first anodization layer and an adjacent second anodization layer on an angled surface, the interface between the two anodization layers being regular and uniform. Described are photomasking techniques and tools for providing sharply defined corners on anodized and texturized patterns on metal surfaces. Also described are techniques and tools for providing anodizing resistant components in the manufacture of electronic devices.
申请公布号 US2013319865(A1) 申请公布日期 2013.12.05
申请号 US201213610813 申请日期 2012.09.11
申请人 BROWNING LUCY ELIZABETH;WOODHULL CHARLES B.;KIPLE BRYAN PATRICK;PAKULA DAVID A.;TAN TANG YEW;HANCHAK-CONNORS JULIE;THORNTON, III JOHN MURRAY;JOHANNESSEN THOMAS;RUSSELL-CLARKE PETER;TATEBE MASASHIGE;TAN NAPTHANEAL Y. 发明人 BROWNING LUCY ELIZABETH;WOODHULL CHARLES B.;KIPLE BRYAN PATRICK;PAKULA DAVID A.;TAN TANG YEW;HANCHAK-CONNORS JULIE;THORNTON, III JOHN MURRAY;JOHANNESSEN THOMAS;RUSSELL-CLARKE PETER;TATEBE MASASHIGE;TAN NAPTHANEAL Y.
分类号 C25D11/02 主分类号 C25D11/02
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