SYSTEM AND METHOD TO OPTIMIZE EXTREME ULTRAVIOLET LIGHT GENERATION

摘要

Energy output from a laser-produced plasma (LPP) extreme ultraviolet tight (EUV) system varies based OH how well the laser beam can maintain focus on a target material to generate the plasma that gives off light. The system and method described herein optimize EUV light generation by using a closed-l'oop gradient process to track and fine-tune in real-time the positioning of optical elements that determine how the laser beam is focused on the target material. When real-time alignment of the drive laser on droplet position Is achieved, EUV generation is optimized.