COATING APPLICATOR, SUBSTRATE PROCESSING SYSTEM, AND SUBSTRATE PROCESSING METHOD

摘要

PROBLEM TO BE SOLVED: To inhibit the occurence of problems due to adherence of a coating liquid to the interior of a coating applicator in the coating applicator which rotates a substrate thereby spreading the coating liquid to a substrate surface.SOLUTION: A coating applicator 10 includes: a cup 11 enclosing a substrate 1; a nozzle 12 discharging a coating liquid to the substrate 1; a rotation part 18 rotating the substrate 1; a discharge passage 14 discharging the coating liquid from the cup 11; and device cleaning parts 16, 17 supplying a cleaning liquid to at least one of an inner wall of the cup 1 and the discharge passage 14.