| 摘要 |
A method for measuring a relative position of a first mark and a second mark by using a detection optical system that irradiates a mark formed on the substrate to detect an image of the mark, includes performing a first processing to detect an image of the first mark by using the detection optical system to irradiate the first mark from the first surface side, performing a second processing to detect an image of the second mark by using the detection optical system to irradiate the second mark from the first surface side with light having a wavelength passing through the substrate in a state where the first mark is out of the field of view of the detection optical system, and calculating a relative position of the first mark and the second mark. |
