发明名称 |
METHOD AND APPARATUS FOR CORRECTING ERRORS ON A WAFER PROCESSED BY A PHOTOLITHOGRAPHIC MASK |
摘要 |
A method for correcting errors on a wafer processed by a photolithographic mask at a wafer processing site is provided. The method comprises measuring errors on the wafer, and modifying a pattern placement on the photolithographic mask by locally applying femtosecond light pulses of a laser system to the photolithographic mask at the wafer processing site. |
申请公布号 |
KR20130132907(A) |
申请公布日期 |
2013.12.05 |
申请号 |
KR20137017957 |
申请日期 |
2011.12.02 |
申请人 |
CARL ZEISS SMS GMBH;CARL ZEISS SMS LTD. |
发明人 |
BEYER DIRK;DMITRIEV VLADIMIR;SHARONI OFIR;WERTSMAN NADAV |
分类号 |
H01L21/027;G03F7/20 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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