BASE GENERATOR, RESIN COMPOSITION FOR CURED FILM FORMATION, CURED FILM, AND FORMING METHOD OF CURED FILM

摘要

PROBLEM TO BE SOLVED: To provide a base generator in which sensitivity to heat and radiation is high, and that is excellent in storage stability under a room temperature condition when used for a resin composition for cured film formation, and moreover, to provide: the resin composition for cured film formation that contains the base generator; a cured film that is formed by using the resin composition for cured film formation, and excels in solvent resistance; and a forming method of the cured film.SOLUTION: A base generator comprises a compound shown by formula (1). Moreover, a resin composition for cured film formation comprises the base generator and a compound having an epoxy group.