RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND COMPOUND

摘要

A resist composition including a base component (A) which exhibits changed solubility in a developing solution under action of acid and an acid generator component (B) which generates acid upon exposure, the acid generator component (B) including a sulfonium compound (B1) having a sulfonio group and an anion group represented by general formula (b1-r-1) shown below in one molecule thereof (wherein Y1 represents a divalent linking group or a single bond; L1 represents an ester bond or a single bond; V1 represents a divalent hydrocarbon group having a fluorine atom; and n represents 0 or 1, provided that, when L1 represents a single bond, n=1).