REFLECTION TYPE BLANK MASKS, METHODS OF FABRICATING THE SAME, AND METHODS OF FABRICATING REFLECTION TYPE PHOTO MASKS USING THE SAME

摘要

Reflection type blank masks are provided. The blank mask includes a substrate, a reflection layer substantially on the substrate, at least one fiducial mark substantially on the reflection layer, an absorption layer substantially on the at least one fiducial mark and the reflection layer, and a resist layer substantially on the absorption layer.