| 摘要 |
PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition capable of forming an insulator film such as an interlayer insulator film for a display element or the like, excellent in transparency, heat-resistance, hardness, etching resistance and low water absorption, having high sensitivity, and with a smaller change amount in film thickness at an unexposed portion, and to provide an interlayer insulator film for a display element formed from the radiation-sensitive resin composition, and a manufacturing method thereof.SOLUTION: The radiation-sensitive resin composition includes: [A] a polymer component including, in an identical or different polymer, a structural unit (I) derived from a cyclic olefin monomer having an acid-dissociative group, and a structural unit (II) different from the structural unit (I) and having a polymerizable group; and [B] a radiation-sensitive acid generating body including a radiation sensitive acid generator. The structural unit (I) of the polymer component [A] may include a structural unit expressed by a formula (1) below. |
