发明名称 SEMICONDUCTOR STRUCTURE HAVING A NITRIDE ACTIVE LAYER ON A DOPED SILICON CARBIDE HEAT SPREADER
摘要 A semiconductor structure having: a doped silicon carbide heat spreader; a semi-insulating silicon carbide layer disposed over the doped silicon carbide heat spreader; and a nitride (such as GaN, Indium nitride, Aluminum nitride) semiconductor layer disposed on the semi-insulating silicon carbide layer.
申请公布号 US2013320356(A1) 申请公布日期 2013.12.05
申请号 US201213486247 申请日期 2012.06.01
申请人 TORABI ABBAS;BIELUNIS ALAN;SOUTHARD TODD;RAYTHEON COMPANY 发明人 TORABI ABBAS;BIELUNIS ALAN;SOUTHARD TODD
分类号 H01L29/24 主分类号 H01L29/24
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