摘要 |
Provided is a polishing composition containing an abrasive and water. The abrasive content in the polishing composition is no less than 0.1% by mass. The abrasive contains zirconium oxide particles. The zirconium oxide particles have a specific surface area of from 1 to 15 m 2 /g. The zirconium oxide particles preferably have a purity of no less than 99% by mass. The polishing composition is used in, for example, polishing a hard and brittle material, such as sapphire, silicon nitride, silicon carbide, silicon oxide, glass, gallium nitride, gallium arsenide, indium arsenide, and indium phosphide.
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申请人 |
FUJIMI INCORPORATED |
发明人 |
MORINAGA, HITOSHI;YAMADA, EIICHI;TAMAI, KAZUSEI;ISHIBASHI, TOMOAKI;OTSU, TAIRA;ISHIHARA, NAOYUKI;TAKAHASHI, YOUHEI |