| 摘要 |
<P>PROBLEM TO BE SOLVED: To improve qualities and yields of a semiconductor and a photomask by providing a resist film of high quality by reducing water in resist. <P>SOLUTION: A coating device includes a filter unit 103 with a cooling mechanism, which is installed in a path through which resist adjusted into a liquid state reaches a dispense nozzle 104 from a resist bottle 100. The resist is cooled through cooling effect of the cooling mechanism, water contained a little in the resist is solidified (formed into ice particles), and the ice particles are captured by a filter 102 in the filter unit 103. <P>COPYRIGHT: (C)2011,JPO&INPIT |
