| 摘要 |
A device for cleaning a substrate according to one embodiment of the present invention processes a cleaning process for the substrate. The device for cleaning the substrate comprises a cleaning chamber, a collection unit, and a barrier forming unit. The cleaning chamber comprises a spin chuck which supports the substrate to be rotated. The collection unit is separated from the spin chuck and surrounds the substrate. The collection unit comprises a plurality of collection cups which collects cleaning solutions in the cleaning process of the substrate. The barrier forming unit forms a fluid barrier inside a collection cup. The present invention efficiently performs a collection process. |
