| 发明名称 |
LITHOGRAPHIC APPARATUS AND METHOD |
| 摘要 |
A lithographic apparatus includes a radiation source configured to produce a radiation beam. The lithographic apparatus also includes a support configured to support a patterning device. The patterning device is configured to impart the radiation beam with a pattern to form a patterned radiation beam. The support is provided with a pellicle which comprises a layer of graphene. |
| 申请公布号 |
KR20130132383(A) |
申请公布日期 |
2013.12.04 |
| 申请号 |
KR20137001957 |
申请日期 |
2011.03.17 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
YAKUNIN ANDREI;BANINE VADIM;LOOPSTRA ERIK;VAN DER SCHOOT HARMEN;STEVENS LUCAS;VAN KAMPEN MAARTEN |
| 分类号 |
G03F7/20;C01B31/04;G02B5/08;G02B5/20;G03F1/24;G03F1/62;G21K1/06 |
主分类号 |
G03F7/20 |
| 代理机构 |
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