| 摘要 |
A semiconductor device has a heterostructure including a first layer (14) of semiconductor oxide material. A second layer (16) of semiconductor oxide material is formed on the first layer (14) of semiconductor oxide material such that a two dimensional electron gas builds up at an interface between the first and second materials. A passivation layer (18) on the outer surface stabilizes the structure. The device also has a source contact (20) and a drain contact (22). |
