POLISHING PAD WITH CONCENTRIC OR APPROXIMATELY CONCENTRIC POLYGON GROOVE PATTERN
摘要
Polishing pads with concentric or approximately concentric polygon groove patterns are described. Methods of fabricating polishing pads with concentric or approximately concentric polygon groove patterns are also described.
申请公布号
EP2668004(A1)
申请公布日期
2013.12.04
申请号
EP20120702367
申请日期
2012.01.19
申请人
NEXPLANAR CORPORATION
发明人
ALLISON, WILLIAM, C.;SCOTT, DIANE;SIMPSON, ALEXANDER, WILLIAM
