| 摘要 |
Provided are a semiconductor device and a method for manufacturing the same. Since an additional space for forming a shield line is unnecessary, the critical dimension of metal lines is reduced, thereby improving data transfer characteristics, signaling characteristics and noise characteristics of the metal lines. The semiconductor device includes: a plurality of metal lines disposed on the semiconductor device; a plurality of insulation layers disposed on the metal lines; and a plurality of shield lines disposed between the insulation layers. |
