| 摘要 |
The present invention relates to a cyclotron and a method for controlling the cyclotron. The cyclotron includes: a main body; a chamber which is positioned inside the main body and forms a space in which particles are accelerated; a magnetism unit which is arranged in a position which is close to the chamber and forms a magnetic field in order to accelerate the particles which process in the chamber; multiple discharge units which are connected to the chamber and are asymmetrically arranged based on the center of the chamber; and a sensor unit which is installed in a position which is close to the discharge unit and senses the discharge state of the chamber. The present invention is able to improve the driving precision of the cyclotron by minimizing the influence of a particle acceleration driving which is caused by a discharge process because a uniform discharge is possible while minimizing the disturbance of the internal space of the chamber during the discharging work of the chamber. |
