WET-ETCHING EQUIPMENT AND ITS SUPPLYING DEVICE

摘要

Provided is a supply device including a supply unit and a control unit. The supply unit includes a run-through supply path for delivering fluids. The control unit comprises a channel and one or more return paths which are adjacent to the channel. The supply unit is positioned inside the channel so that the fluids flow to the channel therethrough. The supply unit is positioned inside the channel for absorbing a part of etching solutions outputted from the channel to allow the return paths to control the output amount of the fluids. Also, web-etching equipment including the supply device is provided.