发明名称 SHOWERHEAD AND SUBSTRATE PROCESSING APPARATUS USING THE SAME
摘要 Disclosed is a showerhead for uniformly injecting a gas onto the entire surface of a substrate and preventing the deflection of the showerhead and a method for manufacturing the same. According to the present invention, the showerhead includes at least one gas chamber, a main body injecting the gas to one surface and supplying the gas to the gas chamber, a deflection prevention pin preventing the deflection of the main body and installed in the gas chamber, and a flow path opened on one surface of the main body, connected to the gas chamber, and penetrating the deflection prevention pin.
申请公布号 KR20130131148(A) 申请公布日期 2013.12.03
申请号 KR20120054994 申请日期 2012.05.23
申请人 LIGADP CO., LTD. 发明人 HONG, SUNG JAE
分类号 H01L21/205 主分类号 H01L21/205
代理机构 代理人
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