发明名称 Nonvolatile semiconductor memory device and manufacturing method thereof
摘要 A nonvolatile semiconductor memory device has a first wire, a second wire, and a memory cell electrically coupled to the first wire at one end and to the second wire at the other end. The memory cell has a resistance change layer to store information by changing a resistance value and a first electrode and a second electrode coupled to both ends of the resistance change layer and not containing a precious metal. The first electrode includes an outside electrode and an interface electrode formed between the outside electrode and the resistance change layer. The thickness of the interface electrode is less than the thickness of the outside electrode. The resistivity of the interface electrode is higher than the resistivity of the outside electrode. The resistance value of the first electrode is lower than the resistance value of the resistance change layer in a low resistance state.
申请公布号 US8598564(B2) 申请公布日期 2013.12.03
申请号 US201213592574 申请日期 2012.08.23
申请人 SAKOTSUBO YUKIHIRO;RENESAS ELECTRONICS CORPORATION 发明人 SAKOTSUBO YUKIHIRO
分类号 H01L47/00 主分类号 H01L47/00
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