发明名称 Resistive memory elements exhibiting increased interfacial adhesion strength, methods of forming the same, and related resistive memory cells and memory devices
摘要 A resistive memory element comprising a conductive material, an active material over the conductive material, and an ion source material on the active material and comprising at least one chalcogen, at least one active metal, and at least one additional element. Additional resistive memory elements, as well as methods of forming resistive memory elements, and related resistive memory cells and resistive memory devices are also described.
申请公布号 US8598560(B1) 申请公布日期 2013.12.03
申请号 US201213547270 申请日期 2012.07.12
申请人 MILOJEVIC MARKO;SMYTHE JOHN A.;SANDHU GURTEJ S.;MICRON TECHNOLOGY, INC. 发明人 MILOJEVIC MARKO;SMYTHE JOHN A.;SANDHU GURTEJ S.
分类号 H01L29/00;G11C11/00;H01L21/8236;H01L29/02;H01L29/04;H01L47/00 主分类号 H01L29/00
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