A flexible membrane for a polishing head comprises a disc-shaped main unit which includes a first face being in contact with one surface of a substrate and a second face being opposite to the first face; expansion units which limit each independent space by protruding vertically from the second face of the main unit; and an inner ring which is mounted inside the outermost expansion units among the expansion units in order to support the edge part, and has flat upper and lower faces in a combined state. When performing a polishing process using the membrane, the surface flatness of a substrate increases.
申请公布号
KR20130131120(A)
申请公布日期
2013.12.03
申请号
KR20120054941
申请日期
2012.05.23
申请人
SAMSUNG ELECTRONICS CO., LTD.
发明人
JANG, YOUNG SEOK;KOH, YOUNG HO;KIM, JAE SUN;KIM, KUEN BYUL;LEE, JAE CHANG;HEO, MIN SUNG;HONG, JIN SUK