| 摘要 |
PURPOSE: A vapor deposition device stably performs a gas activation reaction by improving a gas activation structure of an injector assembly comprising multiple injector modules. CONSTITUTION: A reaction chamber includes a chamber main body which is open upwardly and a chamber lid (120) opening and closing the chamber main body. An injector assembly is disposed inside the reaction chamber and includes multiple injector modules (31) spraying first process gas. A pair of the adjacent injector modules among the injector modules is separated from each other. A gas activation unit (50) activates second process gas by being installed in the reaction chamber. A gas supply module (130) supplies the first process gas and the second process gas to the injector module. |
