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发明名称
光阻组成物
摘要
提供一种不仅提高光阻调制时之溶解性、显像时之光阻膜密着性之特性,提升光阻安定性且安全性亦优异的光阻组成物。;一种光阻组成物,其系包含光阻成分与有机溶剂之光阻组成物,其特征为包含选自(a)由羧酸部分之碳数为2~6之多价羧酸酯所构成的羟基多价羧酸酯化合物群、(b)由羧酸部分之碳数为2~6之乙醯氧基羧酸酯所构成的乙醯氧基羧酸酯化合物群、及(c)羧酸部分之碳数为2~6之烷氧基羧酸酯所构成的烷氧基羧酸酯化合物群中至少1种之有机溶剂作为该有机溶剂。
申请公布号
TWI417652
申请公布日期
2013.12.01
申请号
TW097101731
申请日期
2008.01.17
申请人
戴西尔化学工业股份有限公司 日本
发明人
堀口明;赤井泰之;片山彻
分类号
G03F7/004;C07C69/40;C07C69/67
主分类号
G03F7/004
代理机构
代理人
何金涂 台北市大安区敦化南路2段77号8楼
主权项
地址
日本
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