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发明名称
改善钨沉积拓朴形貌之微机电系统光罩与方法
摘要
本发明揭示一种改善钨沉积拓朴形貌之微机电系统光罩,包含:交会图案,其由至少两不小于最小设计线宽之线段交会形成,且于该交会处的转角,形成由该转角处向该交会处的中心点延伸,使该交会处宽度相对小的凹入图案,其中,该光罩所定义之线段系用以制作沟槽,以供沉积填入钨而构成微机电系统的一部份,且所填入的钨表面最低高度不低于沟槽表面高度的80%。
申请公布号
TWI417646
申请公布日期
2013.12.01
申请号
TW099109470
申请日期
2010.03.29
申请人
原相科技股份有限公司 新竹市新竹科学工业园区创新一路5号5楼
发明人
徐新惠;王传蔚;李昇达;吕志宏
分类号
G03F1/00;B81C1/00
主分类号
G03F1/00
代理机构
代理人
任秀妍 新竹市光复路2段481号9楼
主权项
地址
新竹市新竹科学工业园区创新一路5号5楼
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