| 摘要 |
<p>The present invention relates to a vaporization supply device with which a material concentration in a mixture gas of carrier gas and material gas is adjusted accurately regardless of a solid or liquid material, the carrier gas can be supplied stably to a process chamber under an accurate flow control, and residue of the material can be managed with ease. The present invention comprises: a flow passage (L1) which supplies the carrier gas from a carrier gas supply source to an upper inner space of a source tank; a flow passage (L2) disposed at the flow passage (L1) to supply the mixture gas in the upper inner space of the source tank to the process chamber; a flow control unit disposed at the flow passage (L2) to automatically adjust flow of the mixture gas to a predetermined flow; and a constant temperature heating unit which heats the source tanks, the flow passage (L1), and the flow passage (L2) to a predetermined temperature. Internal pressure of the space is controlled to remain in a desired range while the mixture gas is supplied to the process chamber.</p> |
