| 摘要 |
<p>Provided is a stripping solution recycling system using a photoresist stripping solution that strips a photoresist without damaging a Cu film or reducing the adhesiveness to a layer deposited on the Cu film, when a Cu film or Cu alloy film on a large—area substrate is wet—etched to make wiring or the10 like. The stripping solution recycling system has: a resiststripping device for repeatedly using a stripping solution including a resist composition and a mixed solution containing a main agent, a polar solvent, and water, discharging part of the stripping solution from a discharge tube when the resist15 concentration in the stripping solution reaches a given value,and receiving supply of a fresh stripping solution; a waste tank; a distillation and regeneration device for distilling the stripping solution in the waste tank; a component analyzer for investigating the composition ratio of the main agent and thezo polar solvent in the separated liquid; a preparation device for preparing the mixed solution by adding deficiencies of the main agent, the polar solvent, and the water to show a predetermined ratio of the main agent, the polar solvent, and the water inthe separated liquid; and a supply tank for storing the mixed25 solution.</p> |
