发明名称 |
DEPOSITION SYSTEMS, ALD SYSTEMS, CVD SYSTEMS, DEPOSITION METHODS, ALD METHODS AND CVD METHODS |
摘要 |
<p>Some embodiments include deposition systems configured for reclaiming unreacted precursor with one or more traps provided downstream of a reaction chamber. Some ofthe deposition systems may utilize two or more traps that are connected in parallel relative to one another and configured so that the traps may be alternately utilized fortrapping precursor and releasing trapped precursor back into the reaction chamber.Some of the deposition systems may be configured for ALD, and some may be configured for CVD.FIGURE 1</p> |
申请公布号 |
SG194365(A1) |
申请公布日期 |
2013.11.29 |
申请号 |
SG20130071378 |
申请日期 |
2009.08.05 |
申请人 |
MICRON TECHNOLOGY, INC. |
发明人 |
MARSH, EUGENE, P.;QUICK, TIM;UHLENBROCK, STEFAN;KRAUS, BRENDA |
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