| 摘要 |
<p>An immersion lithographic apparatus is cleaned by use of a cleaning liquid consisting essentially of ultra-pure water and (a) a mixture of hydrogen peroxide and ozone, or (b) hydrogen peroxide at a concentration of up to 5%, or (c) ozone at a concentration of up to 50 ppm, or (d) oxygen at concentration of up to 10 ppm, or (e) any combination selected from (a)-(d). The immersion space (IH) comprises a first inlet connected to a source of immersion liquid (ILS) and a second inlet connected to the cleaning liquid supply system (CLS).</p> |
