ADVANCED DEBRIS MITIGATION OF EUV LIGHT SOURCE

摘要

Systems and methods for debris mitigation in an EUV light source for semiconductor processes are disclosed. Pulsed DC electric fields are applied to the path of EUV light to reject ions from the EUV path. The pulsed DC fields are triggered to coincide with the presence of debris in the EUV optical path. It is emphasized that this abstract is provided to comply with the rules requiring an abstract that will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.