| 摘要 |
PROBLEM TO BE SOLVED: To provide a radio frequency generator in which a plurality of RF power signals generated by a plurality of RF generators are accurately controlled to effectively execute plasma etching.SOLUTION: A radio frequency generator includes: power control modules 74 and 76 generating power signals indicating power levels for a plurality of target states of power amplifiers 42 and 44; frequency control modules 78 and 80 generating frequency signals indicating frequencies for the plurality of target states of the power amplifiers 42 and 44; and pulse generating modules 70 and 72 supplying an output signal to the power amplifiers 42 and 44, recalling at least one of the latest power level and the latest frequency for one of the plurality of target states of the power amplifiers 42 and 44, and on the basis of the power signals, the frequency signals and at least one of the latest power level and the latest frequency of the power amplifiers 42 and 44, adjusting a current power level and a current frequency of the output signal. |
