发明名称 HETEROJUNCTION BIPOLAR TRANSISTORS WITH INTRINSIC INTERLAYERS
摘要 Heterojunction bipolar transistors are provided that include at least one contact (e.g., collector, emitter, and/or base) formed by a heterojunction between a crystalline semiconductor material and a doped non-crystalline semiconductor material layer. An interfacial intrinsic non-crystalline semiconductor material layer is present at the heterojunction between the crystalline semiconductor material and the doped non-crystalline semiconductor material layer. The presence of the interfacial intrinsic non-crystalline semiconductor material layer improves the surface passivation of the crystalline semiconductor material by reducing the interface defect density at the heterojunction.
申请公布号 US2013313551(A1) 申请公布日期 2013.11.28
申请号 US201313839100 申请日期 2013.03.15
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 HEKMATSHOAR-TABARI BAHMAN;NING TAK H.;SADANA DEVENDRA K.;SHAHIDI GHAVAM G.;SHAHRJERDI DAVOOD
分类号 H01L29/737;H01L21/02 主分类号 H01L29/737
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