发明名称 OXIDE SEMICONDUCTOR FIELD EFFECT TRANSISTOR AND METHOD FOR MANUFACTURING THE SAME
摘要 A field effect transistor including a semiconductor layer including a composite oxide which contains In, Zn, and one or more elements X selected from the group consisting of Zr, Hf, Ge, Si, Ti, Mn, W, Mo, V, Cu, Ni, Co, Fe, Cr, Nb, Al, B, Sc, Y and lanthanoids in the following atomic ratios (1) to (3): In/(In+Zn)=0.2 to 0.8(1) In/(In+X)=0.29 to 0.99(2) Zn/(X+Zn)=0.29 to 0.99(3).
申请公布号 US2013313548(A1) 申请公布日期 2013.11.28
申请号 US201313862568 申请日期 2013.04.15
申请人 IDEMITSU KOSAN CO., LTD.;IDEMITSU KOSAN CO., LTD. 发明人 YANO KOKI;KAWASHIMA HIROKAZU;INOUE KAZUYOSHI;TOMAI SHIGEKAZU;KASAMI MASASHI
分类号 H01L29/26 主分类号 H01L29/26
代理机构 代理人
主权项
地址