SLURRY, POLISHING-SOLUTION SET, POLISHING SOLUTION, SUBSTRATE POLISHING METHOD, AND SUBSTRATE

摘要

A polishing solution containing abrasive grains, an additive, and water. Said abrasive grains contain a hydroxide of a tetravalent metal, and an aqueous dispersion containing said abrasive grains in the amount of 1.0 mass% exhibits an absorbance of at least 1.00 but less than 1.50 with respect to light having a wavelength of 400 nm. Furthermore, centrifuging the aqueous dispersion containing the abrasive grains in the amount of 1.0 mass% for 50 minutes at a centrifugal acceleration of 1.59×105 G yields a liquid phase with a non-volatile content of at least 300 ppm.