| 发明名称 |
METHOD AND APPARATUS FOR SUBSTRATE-MASK ALIGNMENT |
| 摘要 |
A shadow masking device for use in the semiconductor industry includes self-aligning mechanical components that permit shadow masks to be exchanged while maintaining precise alignment with the target substrate. The misregistration between any two of the various layers in the formed structure can be kept to less than 40 microns.
|
| 申请公布号 |
US2013316543(A1) |
申请公布日期 |
2013.11.28 |
| 申请号 |
US201213480831 |
申请日期 |
2012.05.25 |
| 申请人 |
ALTKNECHT DAVID J.;ERICKSON ROBERT E.;PARKIN STUART STEPHEN PAPWORTH;LADA CHRISTOPHER O.;SAMANT MAHESH G.;INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
ALTKNECHT DAVID J.;ERICKSON ROBERT E.;PARKIN STUART STEPHEN PAPWORTH;LADA CHRISTOPHER O.;SAMANT MAHESH G. |
| 分类号 |
H01L21/02 |
主分类号 |
H01L21/02 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
