发明名称 PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND EXPOSURE METHOD
摘要 A projection objective includes at least four curved mirrors, which include a first curved mirror that is a most optically forward mirror and a second curved mirror that is a second most optically forward mirror, as defined along a light path. In addition, an intermediate lens element is disposed physically between the first and second mirrors, the intermediate lens element being a single pass type lens. The objective forms an image with a numerical aperture of at least substantially 1.0 in immersion.
申请公布号 US2013314679(A1) 申请公布日期 2013.11.28
申请号 US201313889780 申请日期 2013.05.08
申请人 NIKON CORPORATION;NIKON CORPORATION 发明人 OMURA YASUHIRO
分类号 G03B27/52;G02B17/08;G03F7/20 主分类号 G03B27/52
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