发明名称 |
PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND EXPOSURE METHOD |
摘要 |
A projection objective includes at least four curved mirrors, which include a first curved mirror that is a most optically forward mirror and a second curved mirror that is a second most optically forward mirror, as defined along a light path. In addition, an intermediate lens element is disposed physically between the first and second mirrors, the intermediate lens element being a single pass type lens. The objective forms an image with a numerical aperture of at least substantially 1.0 in immersion. |
申请公布号 |
US2013314679(A1) |
申请公布日期 |
2013.11.28 |
申请号 |
US201313889780 |
申请日期 |
2013.05.08 |
申请人 |
NIKON CORPORATION;NIKON CORPORATION |
发明人 |
OMURA YASUHIRO |
分类号 |
G03B27/52;G02B17/08;G03F7/20 |
主分类号 |
G03B27/52 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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