发明名称 Method for polishing substrate with foamed polishing cloth, involves providing polishing cloth with blind holes whose positions correspond with outlet openings such that polishing agent passes through polishing cloth
摘要 <p>The method involves providing a foamed polishing cloth (1) that occupies outlet openings (3a) of a polishing plate (4). A polishing agent is applied on a side through the outlet openings. The cloth is formed with a porous structure having multiple pores (2), which are partially connected with one another by micro holes (6) that are pierced at a front side. The cloth is provided with blind holes (7) that are not pierced at a cloth front side and reach at a rear side in the cloth, where positions of the blind holes correspond with the outlet openings such that the agent passes through the cloth.</p>
申请公布号 DE102013211086(A1) 申请公布日期 2013.11.28
申请号 DE201310211086 申请日期 2013.06.14
申请人 SILTRONIC AG 发明人 SCHWANDNER, JUERGEN
分类号 H01L21/304 主分类号 H01L21/304
代理机构 代理人
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