| 摘要 |
PROBLEM TO BE SOLVED: To suppress enlargement of a footprint of a local immersion type exposure apparatus.SOLUTION: An exposure apparatus 100 comprises: a fine movement stage WFS1 that can hold liquid Lq with a projection optical system PL when the fine movement stage WFS1 is at a position facing an outgoing surface of the projection optical system PL; and a blade BL that approaches the fine movement stage WFS1 within prescribed distance when the fine movement stage WFS1 is holding the liquid Lq with the projection optical system PL, moves along with the fine movement stage WFS1 while maintaining the approaching state, and then holds the liquid Lq with the projection optical system PL after movement. Thus, it is not necessary that a plurality of stages is interchangeably disposed directly under the projection optical system, thereby suppressing enlargement of a footprint of the exposure apparatus. |
