| 发明名称 |
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COMPOUND AND METHOD OF PRODUCING POLYMERIC COMPOUND |
| 摘要 |
A resist composition which generates acid upon exposure and exhibits changed solubility in an alkali developing solution under action of acid, the resist composition including a polymeric compound containing a base decomposable group in a main chain thereof.
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| 申请公布号 |
US2013316285(A1) |
申请公布日期 |
2013.11.28 |
| 申请号 |
US201313899170 |
申请日期 |
2013.05.21 |
| 申请人 |
TOKYO OHKA KOGYO CO., LTD. |
发明人 |
TAKAKI DAICHI;UTSUMI YOSHIYUKI;ARAI MASATOSHI |
| 分类号 |
G03F7/20;G03F7/004 |
主分类号 |
G03F7/20 |
| 代理机构 |
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代理人 |
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| 主权项 |
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