| 摘要 |
The present invention relates to a method for duplicating a pattern on a cylindrical mold using a UV imprint technique, and more specifically, to a method for duplicating a pattern on a cylindrical mold using a UV imprint technique, which enables the generation of a nano-unit pattern through a simple process, by duplicating a pattern using a UV imprint technique on a cylindrical mold. The method for duplicating a pattern on a cylindrical mold using a UV imprint technique comprises: a first step for coating a UV hardener on the pattern of an original mold, for a stamp cylinder to duplicate the pattern of the original mold while rotating in contact with the original mold, and for irradiating a UV light source on the stamp cylinder; a second step for etching the stamp cylinder duplicated with the pattern of the original mold; a third step for coating the UV hardener on the pattern of the stamp cylinder, for a duplicate mold to duplicate the pattern of the stamp cylinder while rotating in contact with the stamp cylinder, and for irradiating a UV light source on the duplicate mold and duplicating the pattern of the stamp cylinder on the duplicate mold; and a fourth step for etching the duplicate mold duplicated with the pattern of the stamp cylinder. |
