发明名称 Three-Dimensional Semiconductor Architecture
摘要 A system and method for making semiconductor die connections with through-silicon vias (TSVs) are disclosed. TSVs are formed through the substrate to allow for signal connections as well as power and ground connections. In one embodiment this allows these connections to be made throughout the substrate instead of on the periphery of the substrate. In another embodiment, the TSVs are used as part of a power matrix to supply power and ground connections to the active devices and metallization layers through the substrate.
申请公布号 US2013316530(A1) 申请公布日期 2013.11.28
申请号 US201313957701 申请日期 2013.08.02
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. 发明人 LAW OSCAR M.K.;WU KUO H.
分类号 H01L21/768 主分类号 H01L21/768
代理机构 代理人
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