发明名称 OXIDE SPUTTERING TARGET AND PROTECTIVE FILM FOR OPTICAL RECORDING MEDIUM
摘要 PROBLEM TO BE SOLVED: To provide an oxide sputtering target for forming a protective film for an optical recording medium, capable of forming a film that has excellent storage stability, is flexible and hardly breakable, and also the oxide sputtering target capable of being subjected to direct-current sputtering and containing few particles, and to provide a protective film for an optical recording medium, which is produced by using the same.SOLUTION: An oxide sputtering target is an oxidation product with a component composition including 0.1 atom% or more In, 12 atom% or more Cr, and the balance Zn with inevitable impurities, based on the total amount of all the metal components, wherein the total of In and Cr is 53 atom% or less.
申请公布号 JP2013237893(A) 申请公布日期 2013.11.28
申请号 JP20120111109 申请日期 2012.05.15
申请人 MITSUBISHI MATERIALS CORP 发明人 SAITO ATSUSHI;MORI RIE
分类号 C23C14/34;C23C14/08;G11B7/254;G11B7/257;G11B7/26 主分类号 C23C14/34
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