| 摘要 |
PROBLEM TO BE SOLVED: To acquire a reference position of a substrate transfer robot at an operation part.SOLUTION: A substrate processing apparatus comprises: a first substrate transfer chamber provided with a first substrate carrier for carrying a substrate under reduced pressure; a processing chamber which is connected to the first substrate transfer chamber, and includes a first substrate position detector and a first substrate loading part, and processes the substrate under reduced pressure; a spare chamber which is connected to the first substrate transfer chamber, and includes a second substrate position detector and a second substrate loading part, and which switches between reduced pressure and atmospheric pressure; a control part which arranges the substrate loaded on the first substrate carrier in the processing chamber, acquires from the first substrate position detector, a first reference position which serves as a reference when the first substrate carrier loads the substrate on the first substrate loading part, arranges the substrate loaded on the first substrate carrier in the spare chamber, and acquires from the second substrate position detector, a second reference position which serves as a reference when the first substrate carrier loads the substrate on the second substrate loading part; and an operation display part for accepting an instruction for acquiring first and second reference positions and displaying an acquisition state of the first and second reference positions. |
