| 摘要 |
<p>Illumination optical unit (4) for illuminating an object field (5) in a projection exposure apparatus (1), comprising a first facet mirror (13) with a structure, which has a spatial frequency of at least 0.2 mm-1 in at least one direction, and a second facet mirror (14), comprising a multiplicity of facets (14a), wherein the facets (14a) are respectively provided with means for damping spatial frequencies of the structure of the first facet mirror (13).</p> |
