| 摘要 |
<P>PROBLEM TO BE SOLVED: To reduce the flow rate of a fluid circulation system or to eliminate the need for a fluid circulation system when the temperature of a stage is regulated. <P>SOLUTION: The aligner has a wafer stage (4) holding a substrate (101) or a reticle stage (2) holding an original plate, and exposes the substrate (101) held by the wafer stage (4). It has a gas chamber (103) provided to the wafer stage (4) and regulating means (107, 108) for regulating the temperature of the wafer stage (4) by changing the pressure of gas inside the gas chamber (103). <P>COPYRIGHT: (C)2010,JPO&INPIT |
