| 摘要 |
Transparent, scratch-resistant and tough copolyamide molding composition having a scratch-resistance of greater than or equal to grade H, measured according to ASTM D3363-05, producible by polycondensation of a cycloaliphatic diamine or a mixture of at least two cycloaliphatic diamines comprising e.g. 3,3'-dimethyl-4,4'-diaminocyclohexylmethane, 3,3',5,5'-tetramethyl-4,4'-diaminocyclohexylmethane and/or norbornane diamine, with a carboxylic acid mixture comprising at least one aliphatic dicarboxylic acid having 6-18 carbon atoms and at least one aromatic dicarboxylic acid, is claimed. Transparent, scratch-resistant and tough copolyamide molding composition having a scratch-resistance of greater than or equal to grade H, measured according to ASTM D3363-05, producible by polycondensation of a cycloaliphatic diamine or a mixture of at least two cycloaliphatic diamines comprising 3,3'-dimethyl-4,4'-diaminocyclohexylmethane, 3,3',5,5'-tetramethyl-4,4'-diaminocyclohexylmethane, 2,2',3,3'-tetramethyl-4,4'-diaminocyclohexylmethane and/or norbornane diamine, with a carboxylic acid mixture comprising at least one aliphatic dicarboxylic acid having 6-18 carbon atoms and at least one aromatic dicarboxylic acid comprising isophthalic acid, terephthalic acid and/or naphthalenedicarboxylic acid, is claimed. |
