Dual medium filter for ion and particle filtering during semiconductor processing
摘要
The present disclosure is directed to fluid filtering systems and methods for use during semiconductor processing. One or more embodiments are directed to fluid filtering systems and methods for filtering ions and particles from a fluid as the fluid is being provided to a semiconductor wafer processing tool, such as to a semiconductor wafer cleaning tool.
申请公布号
EP2667406(A1)
申请公布日期
2013.11.27
申请号
EP20130168840
申请日期
2013.05.23
申请人
STMICROELECTRONICS, INC.;INTERNATIONAL BUSINESS
发明人
ZHANG, JOHN H.;ECONOMIKOS, LAERTIS;TSENG, WEI-TSU;TICKNOR, ADAM